Method of manufacturing an acoustic mirror for piezoelectric resonator and method of manufacturing a piezoelectric resonator

ABSTRACT

A mirror for a piezoelectric resonator consisting of alternately arranged layers of high and low acoustic impedance is manufactured by at first producing a first layer on which a second layer is produced, so that the second layer partially covers the first layer. Then, a planarization layer is applied on the first layer and on the second layer. Subsequently, a portion of the second layer is exposed by structuring the planarization layer, wherein the portion is associated with an active region of the piezoelectric resonator. Finally, the resulting structure is planarized by removing the portions of the planarization layer remaining outside the portion.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to the field of piezoelectric resonators,e.g. BAW (bulk acoustic wave) resonators, and particularly to a methodof manufacturing an acoustic mirror for a piezoelectric resonator, aswell as to a method of manufacturing a piezoelectric resonator. Inparticular, the present invention relates to a method of manufacturingan acoustic mirror, which is highly planar and has both excellentuniformity in the layer deposition and a planar surface of the entiremirror structure.

2. Description of the Related Art

Radio-frequency filters based on BAW resonators are of great interestfor many RF applications. Substantially, there are two concepts for BAWresonators, so-called thin film BAW resonators (FBAR), on the one hand,as well as so-called solidly mounted resonators (SMR). Thin film BAWresonators include a membrane on which the layer sequence consisting ofthe lower electrode, the piezoelectric layer, and the upper electrode isarranged. The acoustic resonator develops by the reflection at the upperside and at the lower side of the membrane. In the alternative conceptof solidly mounted resonators, an SMR includes a substrate, for examplea silicon substrate, on which the layer sequence consisting of the lowerelectrode, the piezoelectric layer, and the upper electrode is arranged.So as to keep the acoustic waves in the active region in this design, aso-called acoustic mirror is required. It is located between the activelayers, i.e. the two electrodes and the piezoelectric layer, and thesubstrate. The acoustic mirror consists of an alternating sequence oflayers with high and low acoustic impedance, respectively, e.g. layersof tungsten (high acoustic impedance) and layers of oxide material (lowacoustic impedance).

If the mirror contains layers of conducting materials, such as tungsten,it is recommended, for the avoidance of parasitic capacitances in thefilter, to structure (pattern) and substantially limit the correspondingmirror layers to the area below the active resonator region. Thedisadvantage of this procedure is that the topology resulting hereby canno longer be completely planarized. Due to the unevenness, undesiredmodes are induced in the resonator and/or a reduction in the quality ofthe resonator is caused. This problem is very critical in so far asalready small steps or remaining topologies of several percent of thelayer thickness have significant influence on the operation behavior ofsuch a resonator.

On the basis of FIGS. 1 and 2, two known methods of manufacturingacoustic mirrors for piezoelectric resonators or BAW resonators areexplained in greater detail.

FIG. 1 shows a solidly mounted resonator with structured mirror. Theresonator includes a substrate 100 with a lower surface 102 and an uppersurface 104. A layer sequence 106 forming the acoustic mirror isarranged on the upper surface. Between the substrate and the mirror, oneor more intermediate layers serving for stress reduction or adhesionimprovement may be arranged, for example. The layer sequence includesalternately arranged layers 106 a with high acoustic impedance andlayers 106 b with low acoustic impedance, wherein intermediate layersmay be provided between the mirror layers. On the upper surface 104 ofthe substrate 100, a first layer 106 b ₁ with low acoustic impedance isformed. On the layer 106 b ₁, a material 106 a ₁, 106 a ₂ with highacoustic impedance is deposited and structured at the portionsassociated with the active regions of the resonator. Over thisarrangement, a second layer 106 b ₂ with low acoustic impedance isdeposited, upon which in turn a material 106 a ₃, 106 a ₄ with highacoustic impedance is deposited and structured section-wise. Upon thislayer sequence, again a layer with low acoustic impedance 106 b ₃ isdeposited. On the resulting mirror structure, a lower electrode 110, onwhich again the active or piezoelectric layer 112, for example of AlN,is arranged, is at least partially formed. On the piezoelectric layer112, an insulation layer 114 covering the piezoelectric layer 112 exceptfor the regions 116 a and 116 b is formed. Two upper electrodes 118 aand 118 b in contact with the piezoelectric layer in the portions 116 aand 116 b are formed on the piezoelectric layer. A tuning layer 120 aand 120 b, via the thickness of which a resonance frequency of theresonators can be adjusted, is at least partially arranged on the upperelectrode 118 a, 118 b. By the portions of the upper electrode 118 a and118 b in which it is in connection with the piezoelectric layer 112, andthe underlying portions of the lower electrode 110, two BAW resonators122 a and 122 b are defined. The mirror structure 106 shown in FIG. 1includes λ/4 mirror layers 106 a, 106 b.

In the example of a solidly mounted resonator shown in FIG. 1, as it isproduced by Epcos AG, for example, the metallic layers 106 a arestructured without planarizing the resulting topology. The layers 106 bwith low acoustic impedance are deposited over the structured layers 106a, as described above. Thereby, the steps shown in FIG. 1, whichcontinue in the deposition of the overlaying layers, develop. Thisprocedure is disadvantageous regarding the resulting strong topology inthe layers lying above the mirror 106, in particular, with reducedpiezoelectric coupling of the active layer 112 as well as increasedexcitation of undesired vibrational modes arising.

FIG. 2 shows a further example known in the prior art for solidlymounted resonators with a structured mirror. In FIG. 2, again asubstrate 100 is shown, on the upper surface 104 of which an oxide layer124 is deposited, into which a pit or depression 126 is introduced.Further intermediate layers may be provided between the oxide layer 124and the substrate 100. In the pit 126, the acoustic mirror is formed,which consists of a layer sequence comprising a first layer 106 a ₁ withhigh acoustic impedance, a layer 106 b with low acoustic impedance, anda layer 106 a ₂ with high acoustic impedance. On the surface of theresulting structure, an insulation layer 108 is deposited, on which thelower electrode 110 is at least partially formed. The portion of theinsulation layer 108 not covered by the lower electrode 110 is coveredby a further insulation layer 128. On the insulation layer 128 and onthe lower electrode 110, the piezoelectric layer 112 is formed, on thesurface of which the upper electrode 118 is in turn partially formed.The portions of the piezoelectric layer 112 not covered by the upperelectrode 118, as well as parts of the upper electrode 118 are coveredby the passivation layer 114. The overlapping areas of lower electrode110, piezoelectric layer 112, and upper electrode 118 define the BAWresonator 122.

In the example shown in FIG. 2, the pit 126, in which the mirror layers106 a, 106 b are deposited after each other, as described above, isetched into the oxide layer 124 in the area of the resonator 122 to beproduced. By one or more CMP (chemical mechanical polishing) processes,the layers outside the mirror pit 126 are removed, as this is describedin the U.S. patent application US 2002/154425 A1, for example.

The method described on the basis of FIG. 2 is disadvantageous in thatthe layers are slightly thinner in the corners of the mirror pit 126,and a slight key topology in the resonator region 122, indicated withthe reference numeral 130, develops, which again leads to increasedexcitation of undesired modes and to reduced resonator quality.

SUMMARY OF THE INVENTION

Starting from this prior art, it is an object of the present inventionto provide an improved method of manufacturing an acoustic mirror for apiezoelectric resonator, which enables mirrors with excellent uniformityin the layer deposition, as well as a planar surface of the entiremirror structure.

In accordance with a first aspect, the present invention provides amethod of manufacturing an acoustic mirror of alternately arrangedlayers of high and low acoustic impedance, preferably for an acousticresonator, wherein the mirror has a layer sequence of at least one layerwith high acoustic impedance and at least one layer with low acousticimpedance, with the steps of: (a) producing a first layer of the layersequence; (b) producing a second layer of the layer sequence on thefirst layer, such that the second layer partially covers the firstlayer; (c) applying a planarization layer on the first layer and on thesecond layer; (d) exposing a portion of the second layer by structuringthe planarization layer, wherein the portion of the second layer isassociated with an active region of the piezoelectric resonator; and (e)planarizing the structure from step (d) by removing the portions of theplanarization layer remaining outside the portion.

In accordance with a second aspect, the present invention provides amethod of manufacturing an acoustic mirror of alternately arrangedlayers of high and low acoustic impedance, preferably for an acousticresonator, wherein the mirror has an alternating layer sequence of aplurality of layers with high acoustic impedance and a plurality oflayers with low acoustic impedance, with the steps of: (a) alternatelyproducing the first layers and the second layers; (b) applying aplanarization layer on the structure produced in step (a); (c) exposinga portion of the topmost second layer by structuring the planarizationlayer, wherein the portion of the topmost second layer is associatedwith an active region of the piezoelectric resonator; and (d)planarizing the structure from step (c) by removing the portions of theplanarization layer remaining outside the portion.

In accordance with a third aspect, the present invention provides amethod of manufacturing a piezoelectric resonator, with the steps of:(a) producing an acoustic mirror of alternately arranged layers of highand low acoustic impedance, preferably for an acoustic resonator,wherein the mirror has a layer sequence of at least one layer with highacoustic impedance and at least one layer with low acoustic impedance,with the steps of: (a.1) producing a first layer of the layer sequence;(a.2) producing a second layer of the layer sequence on the first layer,such that the second layer partially covers the first layer; (a.3)applying a planarization layer on the first layer and on the secondlayer; (a.4) exposing a portion of the second layer by structuring theplanarization layer, wherein the portion of the second layer isassociated with an active region of the piezoelectric resonator; and(a.5) planarizing the structure from step (a.4) by removing the portionsof the planarization layer remaining outside the portion; (b) producinga lower electrode substantially at least partially on the acousticmirror; (c) producing a piezoelectric layer at least partially on thelower electrode; (d) producing an upper electrode at least partially onthe piezoelectric layer, wherein a region in which the upper electrode,the piezoelectric layer, and the lower electrode overlap, defines anactive region of the piezoelectric resonator.

In accordance with a fourth aspect, the present invention provides amethod of manufacturing a piezoelectric resonator, with the steps of:(a) producing an acoustic mirror of alternately arranged layers of highand low acoustic impedance, preferably for an acoustic resonator,wherein the mirror has an alternating layer sequence of a plurality oflayers with high acoustic impedance and a plurality of layers with lowacoustic impedance, with the steps of: (a.1) alternately producing thefirst layers and the second layers; (a.2) applying a planarization layeron the structure produced in step (a.1); (a.3) exposing a portion of thetopmost second layer by structuring the planarization layer, wherein theportion of the topmost second layer is associated with an active regionof the piezoelectric resonator; and (a.4) planarizing the structure fromstep (a.3) by removing the portions of the planarization layer remainingoutside the portion; (b) producing a lower electrode substantially atleast partially on the acoustic mirror; (c) producing a piezoelectriclayer at least partially on the lower electrode; (d) producing an upperelectrode at least partially on the piezoelectric layer, wherein aregion in which the upper electrode, the piezoelectric layer, and thelower electrode overlap, defines an active region of the piezoelectricresonator.

The inventive method enables the manufacture of a highly planar acousticmirror and produces a mirror ensuring both excellent uniformity in thelayer deposition and a planar surface of the entire mirror structure.Thus, according to the invention, optimum deposition of the layers lyingabove the mirror is enabled, which particularly results in high couplingof the piezoelectric layer. Furthermore, according to the invention,also a very homogenous layer distribution in the mirror is achieved,which again leads go high quality of the resonator and to minimumexcitation of undesired vibrational modes.

According to the invention, the acoustic mirror is manufactured by anovel combination of depositing, structuring (patterning), andplanarizing steps. According to the invention, for this, one or morelayers of the mirror are structured, then a planarization layer isdeposited on the whole area and opened by an etching process in theresonator region. The resonator region is that region of the mirrorassociated with the active region of the piezoelectric resonator,wherein the region to be opened is usually selected greater than theactive resonator region actually resulting later, due to the adjustmenttolerances and due to not exactly perpendicular etching flanks. Then,according to the invention, only the ridges remaining in the overlappingregion are removed by a planarization process, for example by a CMPmethod, wherein the above-described steps are repeated several timesdepending on the number of the layers to be realized in the acousticmirror, according to a preferred embodiment of the present invention.

According to the invention, for opening the planarization layer in thecritical region, an etching process is thus used, which is selectivewith reference to the material of the topmost layer of the mirrorstructure, i.e. this topmost layer serving as etch stop layer. Accordingto the invention, it is thus taken advantage of the fact that suchetching processes largely conserve the topology developed in thedeposition, whereby the inventive, highly planar, acoustic mirrorstructure is securely achieved in the critical region of a BAW resonatoror piezoelectric resonator.

The highly planar shape of the mirror does not only result from theetching procedure. As mentioned above, a non-planar topology resultsalready in the deposition in the method according to FIG. 2, because thedeposition rate in the corners of the mirror pitch is different than atthe center. Moreover, a slight key topology is produced at the centerwhen mechanically polishing. It is the substantial point of the presentinvention that all depositions take place on planar foundation (and thusno topology develops in the deposition), wherein the planarization stepsare chosen so that they do not produce substantial topology in thelayers in the resonator region.

Preferably, the second layer to be structured is a conductive layer. Thelayers for the mirror described in connection with the present inventionmay be divided into either conductive/non-conductive ornon-insulating/insulating layers, or into layers with low or highacoustic impedance. Due to parasitic electrical couplings, when usingconductive layers, these are structured independently of whether theyhave the higher or the lower acoustic impedance. Semiconducting layersmay also be used.

According to a first preferred embodiment of the present invention, thelayer with high acoustic impedance is a conductive layer, and astructuring step and planarization step of its own is performed for eachconductive layer of the mirror structure. In case of a mirror with twoconductive layers, at first all layers up to the first conductive layerare deposited. Then, this is structured and planarized, and then alllayers up to the second conductive layer are deposited and againstructured and planarized (FIG. 3).

In a second embodiment of the present invention, at first all layers ofthe mirror are deposited and the conductive layers structured andplanarized together with non-conductive layers lying therebetween. Asopposed to the first preferred embodiment, here the advantage is thatonly two lithography steps are required, independent of the number ofconductive layers. The first embodiment, however, requires twolithography steps each for every conductive layer to be structured andplanarized. But the etching process is more intensive, and theplanarization is more difficult due to the higher step.

In addition, an etch stop layer may be deposited below the conductivelayers, so that the homogeneity/reproducibility of the etch stop may beimproved with a selective etching process.

Preferably, the etching processes are performed using a resist mask orusing a hard mask, wherein in the second embodiment the use of a hardmask may be necessary due to the longer etching time.

In the above-described embodiment, the plurality of layers may beperformed either in an etching process within one chamber or by severalsuccessive etching processes in various chambers.

In the above-described first embodiment, in which every conducting layeris structured and planarized separately, the same or different masks maybe used to produce substantially equally or differently large layerswith this. In the latter case, a mirror structure of truncated coneshape or truncated pyramid shape may be produced, for example.

According to a further embodiment, the present invention provides amethod of manufacturing a piezoelectric resonator, wherein at first anacoustic mirror according to the present invention is produced, and thena lower electrode is produced on the acoustic mirror. A piezoelectriclayer, on the upper surface of which an upper electrode is at leastpartially produced, is at least partially produced on the lowerelectrode. The region in which the upper electrode, the piezoelectriclayer, and the lower electrode overlap, defines the active region of thepiezoelectric resonator. Furthermore, it may be provided that, prior toproducing the lower electrode, one or more layers with suitable acousticimpedance are applied on the produced acoustic mirror, wherein the lowerelectrode is produced on these layers. In particular, these layers servefor insulation, when the topmost layer in the mirror structure is aconductive layer, or for adjusting certain acoustic properties, such asthe dispersion properties of the layer stack, the resonance frequenciesof further modes (shear wave modes), or the temperature course. Onelayer or a plurality of layers of different materials and with differentlayer thicknesses may be provided.

Furthermore, the present invention provides a method of manufacturingcoupled acoustic resonators. Such resonators are arranged vertically ontop of each other, i.e. the active part of the resonator (lowerelectrode, piezoelectric layer, upper electrode) is present twice,separated by one or more intermediate layers, via which the strength ofthe acoustic coupling may be adjusted. The entire layer stack is placedon the acoustic mirror, like with the individual resonators.

BRIEF DESCRIPTION OF THE DRAWINGS

These and other objects and features of the present invention willbecome clear from the following description taken in conjunction withthe accompanying drawings, in which:

FIG. 1 shows a first example of a solidly mounted resonator withstructured mirror according to the prior art;

FIG. 2 shows a second example of a solidly mounted resonator withstructured mirror according to the prior art;

FIGS. 3(a) to (g) show the steps for manufacturing a highly planaracoustic mirror according to the present invention;

FIGS. 4(a) to (j) show the inventive processing of an acoustic mirrorwith two conductive layers by multiple depositing, structuring, andplanarizing steps according to a first preferred embodiment; and

FIGS. 5(a) to (e) show the inventive processing of an acoustic mirrorwith two conductive layers by common structuring and planarization ofall mirror layers according to a second preferred embodiment of thepresent invention.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

In the subsequent description of the preferred embodiments of thepresent invention, the same or similarly acting elements are providedwith the same reference numerals.

In the subsequent explanations, it is assumed that the layer to bestructured has the higher acoustic impedance. The present invention isnot limited to this embodiment, the inventive method rather works infully analog manner when the conductive layer has the smaller acousticimpedance.

On the basis of FIG. 3, the concept underlying the present inventionwill be explained in greater detail. In FIG. 3(a), a substrate 100 isshown, on the upper surface 104 of which a first layer 106 b ₁ with lowacoustic impedance, e.g. an oxide, is arranged, on which in turn a firstlayer 106 a ₁ with high acoustic impedance, e.g. a tungsten layer oranother suitable conductive layer, has been deposited on the whole area.In addition, as it has been described above, one or more intermediatelayers may be provided between the substrate and the mirror or betweenthe mirror layers. Using a hard mask or a resist mask, the structureshown in FIG. 3(a) is subjected to a structuring process by which thefirst conductive layer 106 a ₁ with high acoustic impedance isstructured to the shape shown in FIG. 3(b).

On the structure shown in FIG. 3(b), then a planarization layer 132 isdeposited on the whole area, as this is shown in FIG. 3(c). Theplanarization layer 132 is structured using a suitable mask, for examplea resist mask or a hard mask, so as to define the portions of theplanarization layer 132 to be removed in a subsequent etching process.

The structure shown in FIG. 3(c) after the masking and after the etchingprocess is shown in FIG. 3(d). The planarization layer 132 is removed inthe region 134, such that a surface 136 of the first layer 106 a ₁ withhigh acoustic impedance is exposed, and the ridges 132 a, 132 b of theplanarization layer 132 only remain in the peripheral region. Theportion 134 includes at least the active region of the piezoelectricresonator with which the mirror to be produced is used, wherein theregion 134 is usually chosen slightly greater than the active region ofthe piezoelectric resonator actually resulting later, due to theadjustment tolerances and the oblique etching flanks.

The structure shown in FIG. 3(d) is subjected to a planarization processleading to the removal of the ridges 132 a and 132 b, for example by aCMP process. The structure resulting after the planarization is shown inFIG. 3(e), in which the structure comprises a planar surface, whereinthe surface 136 of the first layer 106 a ₁ is substantially flush with asurface 138 of the portions of the planarization layer 132 arranged onthe first layer 106 b ₁ with low acoustic impedance.

Subsequently, the steps illustrated on the basis of FIGS. 3(a) to 3(e)are repeated, so that the structure shown in FIG. 3(f) with two layerswith high acoustic impedance 106 a ₁ and 106 a ₂, as well as with twolayers with low acoustic impedance 106 b ₁ and 106 b ₂ results.

On the structure shown in FIG. 3(f), one or more layers 140 forinsulation, when the topmost layer in the mirror structure is aconductive layer, or for adjusting certain acoustic properties aredeposited, as this is shown in FIG. 3(g). The lower electrode, thepiezoelectric layer, as well as the upper electrode may be deposited onthis structure, for example, in the manner described on the basis ofFIG. 2 for producing a BAW resonator. Furthermore, an intermediate layermay be applied on the resonator, on which a further resonator structureis produced, to produce two coupled resonators.

On the basis of FIG. 4, a first preferred embodiment of the presentinvention will be explained in greater detail, namely the inventiveprocessing of an acoustic mirror with two conductive layers by multipledepositing, structuring, and planarizing steps.

The procedural steps shown in FIGS. 4(a) to 4(e) correspond to theprocedural steps described on the basis of FIGS. 3(a) to (e), so thatrenewed description thereof is omitted. A second layer 106 a ₂ with highacoustic impedance, for example again a tungsten layer or anothersuitable metal layer, is then deposited on the structure shown in FIG.4(e) on the whole area, as this is shown in FIG. 4(f). Using theabove-described processes, the layer 106 a ₂ is then structured, so thatthe structure shown in FIG. 4(g) results. A further planarization layer132 is then deposited on this structure, as this is shown in FIG. 4(h).This is again structured, and the portion 134 is opened by means of anetching step, to expose the surface 136 of the layer 106 a ₂.

Again, the ridges 132 a and 132 b remain, as this is shown in FIG. 4(i).After the planarization of the structure shown in FIG. 4(i), thestructure shown in FIG. 4(j) with the planar surface results, i.e. astructure in which the surfaces 136 and 138 are substantially flush.

On the basis of FIG. 5, a second preferred embodiment of the presentinvention will be explained in greater detail in the following, namelythe processing of an acoustic mirror with two conductive layers bycommon structuring and planarizing of all conductive mirror layers.

In FIG. 5(a), the substrate 100, on the upper surface 104 of which theinsulation layer 108 is arranged, is shown. In contrast to thepreviously described embodiments, the layer sequence consisting of afirst layer 106 b ₁ with low acoustic impedance, a first layer 106 a ₁with high acoustic impedance, a further layer 106 ₂ with low acousticimpedance, and a further layer 106 a ₂ with high acoustic impedance isproduced on the surface 104 of the substrate 100 according to the secondembodiment of the present invention, as this is shown in FIG. 5(a).

The structure shown in FIG. 5(a) is then subjected to a structuringprocess, wherein the lowest layer 106 b ₁ is not structured. Bycustomary masking and etching steps, the layer sequence of the layers106 a ₁, 106 b ₂, 106 a ₂ is given the desired structure, as it is shownin FIG. 5(b). The planarization layer 132 is deposited over thisstructure, so that the structure shown in FIG. 5(c) results. Similar tothe preceding embodiments, structuring of the layer 132 now takes placesuch that an upper surface of the second layer 106 a ₂ with highacoustic impedance is exposed, and only the ridges 132 a and 132 bremain, as this is shown in FIG. 5(d). A subsequent planarization stepremoves the ridges 132 a and 132 b, so that the structure shown in FIG.5(e) results.

A lower electrode, a piezoelectric layer, as well as an upper electrodemay be applied on the structure shown in FIG. 5(e), just like on thestructure shown in FIG. 4(j), in order to complete processing thepiezoelectric resonator device, as this has already been explained aboveon the basis of FIG. 3.

Although the above-described acoustic mirrors according to the preferredembodiments of the present invention comprise a layer with high acousticimpedance, for example a metal layer, as the topmost layer, the presentinvention is not limited to such a mirror structure. Rather, by means ofthe inventive method, also a mirror structure the topmost surface ofwhich is a layer with low acoustic impedance may be produced.Furthermore, tungsten layers were mentioned above as layer with highacoustic impedance, and oxide layers were mentioned as layer with lowacoustic impedance.

The present invention is not limited to these materials, but othermaterials having high acoustic impedance or low acoustic impedance,conductive or non-conductive materials, may be equally employed.

As has been described above, the structured mirror layers may be ofvariable size, so that a structure of truncated cone of truncatedpyramid shape results. In principle, the layout of the resonator/mirrormay, however, also have any shape (e.g. a trapezoid), whereby aninteresting shape results for the three-dimensional mirror. Inprinciple, it is even of advantage when the resonators are not round orrectangular, because regular shapes have many additional (mostlyunwanted) vibrational modes of similar resonance frequency.

In connection with the subject of the present invention, however, it isto be noted that the shape of the resonator/mirror is insignificant. Thestructured layers may thus all be equally large or not (i.e. cuboids ortruncated pyramid or the like).

Furthermore, the present invention is independent of the thickness ofthe layers in the mirror. The acoustic mirror usually is no λ/4 mirror,since there are various modes and wave types (longitudinal/shear waves).For this reason, it is mostly favorable to make the layer constructionnot periodic, i.e. each layer has different thickness.

The above description of the preferred embodiments substantially refersto the acoustically or electrically relevant layers in the mirror. Inaddition to these layers, however, also further layers or intermediatelayers may be provided. For example, in the mirror structure and in theresonator structure arranged thereupon, one or more structured orunstructured intermediate layers serving as etch stop layers and/oradhesion-promoting layers may be provided. Furthermore, suchintermediate layers may serve for further influencing the acousticproperties of the mirror, the resonator structure, or the overallstructure. Furthermore, on the resonator structure or the overallstructure, one or more structured or unstructured layers for protectionand/or for further influencing the acoustic properties of the overallstructure may be applied, for example tuning layers and/or passivationlayers.

While this invention has been described in terms of several preferredembodiments, there are alterations, permutations, and equivalents whichfall within the scope of this invention. It should also be noted thatthere are many alternative ways of implementing the methods andcompositions of the present invention. It is therefore intended that thefollowing appended claims be interpreted as including all suchalterations, permutations, and equivalents as fall within the truespirit and scope of the present invention.

REFERENCE NUMERAL LIST

-   100 substrate,-   102 lower surface of the substrate,-   104 upper surface of the substrate,-   106 layer sequence of the mirror,-   106 a layer with high acoustic impedance,-   106 a ₁, 106 a ₂ layer with high acoustic impedance,-   106 b layer with low acoustic impedance,-   106 b ₁, 106 b ₂ layer with low acoustic impedance,-   108 insulation layer,-   110 lower electrode,-   112 piezoelectric layer,-   114 insulation layer,-   116 a, 116 b open regions in the insulation layer 114,-   118 upper electrode,-   118 a, 118 b upper electrode,-   120 a, 120 b tuning layer,-   122 BAW resonator,-   122 a, 122 b BAW resonator,-   124 oxide layer,-   126 depression,-   128 insulation layer,-   130 key topology,-   132 planarization layer,-   132 a, 132 b ridges of the planarization layer,-   134 opened region of the planarization layer,-   136 surface of the first 106 a ₁,-   138 surface of the planarization layer,-   140 layer

1. A method of manufacturing an acoustic mirror of alternately arrangedlayers of high and low acoustic impedance, wherein the mirror comprisesa layer sequence of at least one layer with high acoustic impedance andat least one layer with low acoustic impedance, comprising the steps of:(a) producing a first layer of the layer sequence; (b) producing asecond layer of the layer sequence on the first layer, such that thesecond layer partially covers the first layer; (c) applying aplanarization layer on the first layer and on the second layer; (d)exposing a portion of the second layer, the exposed portion of thesecond layer associated with an active region of the piezoelectricresonator; and (e) planarizing the structure from step (d) by removingat least part of the planarization layer remaining outside the exposedportion of the second layer.
 2. The method of claim 1, wherein thesecond layer is a conductive layer.
 3. The method of claim 1, whereinthe mirror includes a plurality of first layers and a plurality ofsecond layers, wherein the method includes the steps of: repeating thesteps (a) to (e) for each successive first layer and second layer. 4.The method of claim 3, wherein the step (b) includes structuring thesecond layer, wherein a plurality of the second layers are structuredwith substantially the same masks, to produce structured second layerswith substantially the same dimensions.
 5. The method of claim 3,wherein the step (b) includes structuring the second layer, wherein aplurality of the second layers are structured with different masks each,to effect a predetermined shape of the mirror.
 6. The method of claim 5,wherein the predetermined shape of the mirror includes a truncated coneshape or truncated pyramid shape.
 7. The method of claim 1, wherein stepd) further comprises structuring the planarization layer using a mask.8. The method of claim 7, wherein the mask comprisesa resist mask or ahard mask.
 9. The method of claim 1, further comprising applying an etchstop layer on the first layer prior to the step of exposing.
 10. Themethod of claim 1, wherein the first layer is a non-conductive layer,and wherein the second layer is a conductive layer.
 11. The method ofclaim 1, wherein the first layer is an oxide layer, and wherein thesecond layer is a tungsten layer.
 12. The method of claim 1, whereinstep (e) further comprises planarizing the structure such that a surfaceof the second layer and a surface of the planarization layer applied onthe first layer are substantially flush.
 13. A method of manufacturingan acoustic mirror of alternately arranged layers of high and lowacoustic impedance, wherein the mirror comprises an alternating layersequence of a plurality of layers with high acoustic impedance and aplurality of layers with low acoustic impedance, comprising the stepsof: (a) alternately producing the first layers and the second layers;(b) applying a planarization layer on the structure produced in step(a); (c) exposing a portion of a topmost second layer, wherein theportion of the topmost second layer is associated with an active regionof the piezoelectric resonator; and (d) planarizing the structure fromstep (c) by removing at least part of the planarization layer remainingoutside the portion.
 14. The method of claim 13, wherein the topmostsecond layer is a conductive layer.
 15. The method of claim 13, whereinstep (c) further comprises structuring the planarization layer using amask.
 16. The method of claim 15, wherein the mask comprises a resistmask or a hard mask.
 17. The method of claim 13, further comprisingapplying an etch stop layer between the first layer and an initialsecond layer.
 18. The method of claim 13, wherein the first layercomprises a non-conductive layer, and wherein the second layer comprisesa conductive layer.
 19. The method of claim 13, wherein the first layercomprises an oxide layer, and wherein the second layer comprises atungsten layer.
 20. The method of claim 13, wherein step (d) furthercomprising planarizing the structure such that a surface of the secondlayer and a surface of the planarization layer applied on the firstlayer are substantially flush.
 21. A method of manufacturing apiezoelectric resonator, comprising the steps of: (a) producing anacoustic mirror of alternately arranged layers of high and low acousticimpedance, wherein the mirror comprises a layer sequence of at least onelayer with high acoustic impedance and at least one layer with lowacoustic impedance, comprising the steps of: (a.1) producing a firstlayer of the layer sequence; (a.2) producing a second layer of the layersequence on the first layer, such that the second layer partially coversthe first layer; (a.3) applying a planarization layer on the first layerand on the second layer; (a.4) exposing a portion of the second layer bystructuring the planarization layer, wherein the portion of the secondlayer is associated with an active region of the piezoelectricresonator; and (a.5) planarizing the structure from step (a.4) byremoving at least part of the planarization layer remaining outside theportion; (b) producing a lower electrode substantially at leastpartially on the acoustic mirror; (c) producing a piezoelectric layer atleast partially on the lower electrode; (d) producing an upper electrodeat least partially on the piezoelectric layer, wherein a region in whichthe upper electrode, the piezoelectric layer, and the lower electrodeoverlap, defines an active region of the piezoelectric resonator. 22.The method of claim 21, further comprising, prior to producing the lowerelectrode, providing one or more layers for insulation or for adjustingfurther acoustic properties of the resonator on the acoustic mirror, andwherein the lower electrode is produced on the one or more layers. 23.The method of claim 21, comprising the steps of: (e) producing anintermediate layer on the structure from step (d); and repeating thesteps (b) to (c) to produce a further resonator structure on theintermediate layer.
 24. A method of manufacturing a piezoelectricresonator, comprising the steps of: (a) producing an acoustic mirror ofalternately arranged layers of high and low acoustic impedance, whereinthe mirror comprises an alternating layer sequence of a plurality oflayers with high acoustic impedance and a plurality of layers with lowacoustic impedance, comprising the steps of: (a.1) alternately producingthe first layers and the second layers; (a.2) applying a planarizationlayer on the structure produced in step (a.1); (a.3) exposing a portionof a topmost second layer by structuring the planarization layer,wherein the portion of the topmost second layer is associated with anactive region of the piezoelectric resonator; and (a.4) planarizing thestructure from step (a.3) by removing the portions of the planarizationlayer remaining outside the portion; (b) producing a lower electrodesubstantially at least partially on the acoustic mirror; (c) producing apiezoelectric layer at least partially on the lower electrode; (d)producing an upper electrode at least partially on the piezoelectriclayer, wherein a region in which the upper electrode, the piezoelectriclayer, and the lower electrode overlap, defines an active region of thepiezoelectric resonator.
 25. The method of claim 24, further comprising,prior to producing the lower electrode, producing one or more layers forinsulation or for adjusting further acoustic properties of the resonatoron the acoustic mirror, wherein the lower electrode is produced on theone or more layers.
 26. The method of claim 24, comprising the steps of:(e) producing an intermediate layer on the structure from step (d); andrepeating the steps (b) to (c) to produce a further resonator structureon the intermediate layer.